Ideal Deposition’s hybrid system integrates spatial ALD and inline PECVD to balance film quality and production efficiency
The iALD-IV platform processes 88 G12 or 108 M10 wafers per batch, achieving throughputs up to 14,500 wafers/hour for M10
According to the company, the modular design allows expansion with up to 3 process chambers, supporting flexible throughput requirements
Ideal Deposition is a long-time player in the ALD segment that has developed a hybrid platform combining key aspects of spatial ALD and inline PECVD. The system closely resembles remote plasma inline PECVD tools. Unlike the typical spatial ALD tools, which operate at atmospheric pressure, Ideal Energy’s ALD system works in a vacuum. While vacuum pumps make the tool relatively more expensive, this low-pressure deposition not only improves reliability in mass production but also eases the integration. The wafers are processed in a carrier that moves through different reaction zones to achieve the deposition on a single side, similar to spatial ALD systems.
According to the company, this hybrid platform combines the high efficiency potential of ALD with the operational benefits of PECVD. The approach of placing wafers in carriers reduces the risk of breakage. When compared to batch tools, which offer a better price proposition and smaller footprint, the technology department of Ideal Deposition claims that its hybrid platform results in better thickness uniformity and quality of the aluminum oxide film. As a result, both the yield and efficiency are better. Ideal Deposition’s inline tool platform is flexible in terms of the ability to add further process chambers depending on the required throughput.
For the latest TaiyangNews Market Survey on Solar Cell Production Equipment 2025, the company has provided data for iALD-IV, a product that has not undergone any change. It supports wafer sizes ranging from 156 mm to 230 mm and processes wafers in horizontal orientation using carriers, 88 wafers for G12 and 108 for M10. Its throughput reaches up to 14,500 wafers per hour for M10 and 10,500 for G12, with film thicknesses ranging from 5 to 8 nm. The system's modular configuration allows hooking up to 3 process chambers. Expanding its know-how in developing hybrid ALD, Ideal Deposition is positioning itself for future-ready solar technologies. The company developed spatial ALD technology optimized for large-area, ultrathin film deposition for perovskite and tandem cell structures.