BatchTex 3 N600 achieves up to 15,000 wafers per hour, enabling more than 1 GW of annual production per tool
Ozone-based oxidation and cleaning offers cost benefits over hydrogen peroxide, with support for wafers down to 100 µm thickness
BatchTex 3 N600 Combi and N400 XL Combi remain in the lineup, offering dual-chemistry options and throughputs from 6,300 to 15,000 wafers per hour
For the latest TaiyangNews Market Survey on Solar Cell Production Equipment 2025, RENA has provided data for 3 models, the latest being BatchTex 3 N600. This high-throughput texturing tool processes up to 120 wafers per carrier, with 6 carriers per bath, achieving a nominal throughput of 13,800 wafers per hour and up to 15,000 wafers per hour at peak capacity.
According to RENA, this tool alone can support over 1 GW of production capacity. It incorporates ozone-based oxidation and cleaning, which is preferred over hydrogen peroxide due to its better cost efficiency. The tool accommodates various wafer formats with only minor carrier modifications, supporting wafers up to G13 size and 100 µm thickness. It has a rated uptime of 92%, factoring in the bath change time using RENA MonoTex.
The 2 BatchTex models listed last year remain in the lineup. BatchTex 3 N600 Combi (H2O2 / O3) has a similar batch capacity and throughput, rated at up to 15,000 wafers per hour for M6 wafers and 12,500 for M10/G12. This system supports both ozone and hydrogen peroxide-based cleaning and is rated for a mechanical yield of 99.9% and uptime of 96% (excluding bath change). The N400 XL Combi, another earlier-generation model, handles 400 wafers per batch and achieves a throughput of over 7,200 (M6) and 6,300 wafers per hour (M10/G12). It also supports both cleaning chemistries and has the same uptime rating.