LPCVD Platform From Shenzhen S.C For TOPCon Solar Cells

The LD-420MAX system uses a horizontal tube architecture with multi-zone temperature control and segmented air inlets for uniform oxide and polysilicon deposition
Rear Passivation Via PECVD: Shenzhen S.C’s plate-type PECVD system handles tunnel oxide, poly-Si, and in-situ doping in a single tool, supporting M10 and G12 formats. (Source: Shenzhen S.C)
Rear Passivation Via PECVD: Shenzhen S.C’s plate-type PECVD system handles tunnel oxide, poly-Si, and in-situ doping in a single tool, supporting M10 and G12 formats. (Source: Shenzhen S.C)
Published on
Key Takeaways
  • Shenzhen S.C’s LPCVD platform supports tunnel oxide and polysilicon deposition for TOPCon cell fabrication

  • The LD-420MAX configuration accommodates up to 1,644 M10 or 1,430 G12 wafers, achieving throughputs of 5,900 and 5,100 wafers/hour, respectively

  • Multi-zone heating and segmented air inlets enhance temperature uniformity and film quality across wafers

Shenzhen S.C, leading Chinese supplier of photovoltaic manufacturing equipment, offers turnkey solutions for most of the advanced solar cell architectures, including TOPCon, HJT, and tandem technologies. The company provides a variety of vacuum coating systems for passivation. Shenzhen S.C offers both PECVD and LPCVD solutions for TOPCon; however, it has not provided the specifications. Thus, the products are not listed in the survey tables.

According to the company’s brochure, its LPCVD tool is built around a horizontal tube furnace architecture that employs a 6-tube configuration. An optional 5-tube setup is also on offer, depending on the required throughput. As with other LPCVD systems promoted for this application, this LPCVD tool is designed for tunneling oxide growth and the deposition of both intrinsic and doped polysilicon. However, most of the process specs refer to intrinsic poly. The company highlights that the LPCVD process has a negligible effect on the coating rate on the density of loaded wafers. Its maximum configuration, called LD-420MAX, can be loaded with 1,644 wafers of M10 and 1,430 of G12 substrates, referring to the single wafer per slot configuration. The tool has a rated throughput of 5,900 wafers per hour for M10 and 5,100 for G12.

The company highlights the important characteristics of the tool that contribute to better film quality, including low-pressure and hot-wall process characteristics that enable better film uniformity and compactness; multiple temperature zones, ensuring consistent thermal profiles across wafers; and independently adjustable segmented air inlets, effectively compensating for airflow depletion.

The text is an edited excerpt from TaiyangNews’ latest Market Survey on Solar Cell Production Equipment 2025, which can be downloaded for free here.

Related Stories

No stories found.
logo
TaiyangNews - All About Solar Power
taiyangnews.info